[1]
N. Farahbakhsh, S. Sanjabi, J. Ind. Eng. Chem. 2019, 70, 211.Google Scholar
[2]
R. O. Apaydın, B. Ebin, S. Gürmen, Metall Mater. Trans A. 2016, 47, 3744.Google Scholar
[3]
W. J. Lee, Y. K. Park, J. S. Kim, B. J. Kim, K. H. An, H. Lee, S. C. Jung, J. Nanosci. Nanotechnol. 2019, 19, 2362.Google Scholar
[4]
X. F. Hou, Y. H. Zhang, H. Ding, P. K. Chu, Particuology 2018, 40, 105.Google Scholar
[5]
K. J. Carroll, S. Calvin, T. F. Ekiert, K. M. Unruh, E. E. Carpenter, Chem. Mater. 2010, 22, 2175.Google Scholar
[6]
P. Majerič, D. Jenko, B. Friedrich, R. Rudolf, Metals 2018, 8, 278Google Scholar
[7]
Y. S. Park, C. Y. An, P. K. Kannan, N. Seo, K Zhuo, T. K. Yoo, C. H. Chung, Appl. Surf. Sci. 2016, 389, 865.Google Scholar
[8]
Q. Dong, C. Huang, G. J. Duan, F. Zhang, D. A. Yan, Mater. Lett. 2017, 186, 263.Google Scholar
[9]
E. B. Choi, J. H. Lee, Appl. Surf. Sci. 2017, 415, 67.Google Scholar
[10]
L. Avramović, V. M. Maksimović, Z. Baščarević, N. Ignjatović, M. Bugarin, R. Marković, N. D. Nikolić, Metals 2019, 9, 56.Google Scholar
[11]
T. G. Kim, H. J. Park, K. Woo, S. Jeong, Y. Choi, S. Y. Lee, ACS Appl. Mater. Interfaces 2018, 10, 1059.Google Scholar
[12]
B. Madavali, J. H. Lee, J. K. Lee, K. Y. Cho, S. Challapalli, S. J. Hong, Powder Technol. 2014, 256, 251.Google Scholar
[13]
L. Y. Bai, H. B. Zhang, H. C. Jin, J. cluster Sci. 2012, 23, 357.Google Scholar
[14]
S.Mahadevan, A. P. S. Chauhan, Adv. Powder Technol. 2016, 27, 1852.Google Scholar
[15]
K. Aruna, K. Aravindha, S. Karthikeyanb, P. A. Jeeva, K. Raja, Mater. Today: Proceedings 2018, 5, 13102.Google Scholar
[16]
X. G. Cao, H. Y. Zhang, Powder Technol. 2012, 226, 53.Google Scholar
[17]
W. L. Li, H. Zhang, Y. Gao, J. T. Jiu, C. F. Li, C. T. Chen, D. W. Hu, Y. Goya, Y. T. Wang, H. Koga, S. Nagao, K. Suganuma, J. Mater. Chem. C 2017, 5, 1155.Google Scholar
[18]
G. Kawamura, S. Alvarez, I. E. Stewart, M. Catenacci, Z. F. Chen, Y. C. Ha, Sci. Rep. 2015, 5, 18333.Google Scholar
[19]
Y. G. Guo, L. J.Wan, J. R. Gong, C. L. Bai, Phys. Chem. Chem. Phys. 2002, 4, 3422.Google Scholar
[20]
M. A. Willard, L. K. Kurihara, E. E. Carpenter, S. Calvin, V. G. Harris, Int. Mater. Rev. 2004, 49, 125.Google Scholar
[21]
J. Chen, J. Chen, Y. Li, W. X. Zhou, X. M. Feng, Q. L. Huang, J. G. Zheng, R. Q. Liu, Y. W. Ma, W. Huang, Nanoscale 2015, 7, 16874.Google Scholar
[22]
T. Sakaue, K. Furumoto, K. Yoshimaru, JP. 013122, 2005.Google Scholar
[23]
R. Xu, K. G. Zhou, M. Y. Hu, Rare Metal Mater. Eng. 2008, 37, 905.Google Scholar
[24]
S. J. Oh, Y. Jo, E. J. Lee, S. S. Lee, Y. H. Kang, H. J. Jeon, S. Y. Cho, J. S. Park, Y. H. Seo, B. H. Ryu, Y. Choi, S. Jeong, Nanoscale 2015, 7, 3997.Google Scholar
[25]
B. K. Park, S. Jeong, D. Kim, J. Moon, S. Lim, J. S. Kim, J. Colloid. Interface Sci. 2007, 311, 417.Google Scholar
[26]
V. Mancier, C. Rousse-Bertrand, J. Dille, J. Michel, P. Fricoteaux, Ultrason. Sonochem. 2010, 17, 690.Google Scholar
[27]
S. Pérez-Rodríguez, D. Torres, M. J. Lázaro, Powder Technol. 2018, 340, 380.Google Scholar
[28]
J. M. Montes, F. G. Cuevas, J. Cintas, J. M. Gallardo, J. Mater. Sci. 2016, 51, 822.Google Scholar
[29]
X. X. Jiang W. Shen, The Fundamentals and Practice of Electroless Plating, National Defense Industry Press, Beijing, China, 2000.Google Scholar
[30]
L. Y. Bai, F. L. Yuan, Q. Tang, J. L. Li, H. Ryu, J. Mater. Sci. 2008, 43, 1769.Google Scholar
[31]
B. J. Gao, J. F. Gao, H. M. Jiang, Z. X. Zhang, Acta Phys.-Chim. Sin. 2000, 16, 366.Google Scholar
[32]
L. Y. Bai, J. M. Fan, P. Hu, F. L. Yuan, J. L. Li, Q. Tang, J Alloys Compd. 2009, 48, 1563.Google Scholar
[33]
K. Bangshang, K. Qitai, J. Keyan. Manufacturing methods of nickel-plated copper powder and nickel-plated copper powder. China Patent, 200580024434.4Google Scholar